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Subject: Atomic layer deposition
Subject: Atomic layer deposition
FAST ID: 1909248 |
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Academic Publications
Single Atomic Layer Ferroelectric on Silicon
Mehmet Dogan
; et al.
Nano Letters
, 2017,
journal article
Q1
, view journal ranking details
Nano Letters (2017)
SJR
2.5940
H-index
584
Publisher
American Chemical Society
ISSN
15306992, 15306984
Coverage
2001-2026
Journal quartile details
Discipline
Overall Quartile
Not reported
Q1
A discipline-specific ranking was unavailable; the title-level overall quartile is shown.
Cited by 29
Physics
Atomic layer deposition
Ferroelectric thin films
Interfaces (Physical sciences)
Semiconductors
Silicon
MoS2 functionalization for ultra-thin atomic layer deposited dielectrics
Angelica Azcatl; Stephen McDonnell;
Santosh KC
; et al.
Appl. Phys. Lett.
, 2014,
journal article
Cited by 215
Mechanical Engineering
GREW Fellow
Atomic layer deposition
Molybdenum disulfide
Nanotechnology
Thin films
